HteLabs - THIN FILM DEPOSITIONS

HTELabs THIN FILM DEPOSITIONS

HTE LABS has developed a large array of thin film deposition processes. High quality sputtered thin films are deposited on various substrates: Silicon, GaAs, Al2O3 ceramics, Sapphire, Aluminum Nitride, PZT, Polyamides, etc.

HTE LABS THIN FILMS CAPABILITIES
RESISTIVE FILMS	High stability, Laser trim able, Low TCR
NiCr	5, 10, 25,...200, 300, 400 ohms/sq, +/-10 to +/-100ppm/degC
TaN2	25,50,500,1000, to 2500 ohms/sq, +/-5 to +/-150ppm/degC
SiCr	0.5K, 1K, 2.5K, 5K, 10k, 20K ohms/sq, +/-10 to +/-200ppm/degC
DIFFUSION BARRIER METALS	Ni, Mo, Pt, Pd, Ta, Ti, TiW, TiNx, TiW:Nx.....
ADHESION LAYERS	Cr, Mo, Ni, NiCr, Si, Ti, TiW, TiNx....
CONDUCTIVE LAYERS	Al, Au, beta-Ta, Cu, Ni, Sn, SnPb, Zr...
NITRIDE AND OXIDE FILMS	AlN, Fe2O3, Si3N4

Home Corporate Information USA Sales Reps International Sales Reps